Photovoltaic
PC-based PECVD system solution
Background of the project
PECVD uses microwaves or radio frequencies to ionize the gas containing the atoms that make up the film to form a plasma locally. The plasma is very chemically active and can easily react to deposit the desired film on the substrate. In order to enable chemical reactions to proceed at lower temperatures, the activity of plasma is used to promote the reaction, so this type of CVD is called plasma enhanced chemical vapor deposition (PECVD).
System specification
Tujian Automation combines BECKHOFF's PC-based control platform with rich remote IO stations and powerful software platform capabilities to provide a perfect solution for PECVD equipment. The use of TwinCAT HMI brings customers a new web-based human-computer interaction experience. With the help of IoT technology, batch deployment and remote maintenance of equipment can be easily realized.
System architecture diagram

Solution advantages
PC-based control system with high performance and strong scalability;
EtherCAT fieldbus is compatible with all third-party EtherCAT slave stations and other fieldbus products;
The temperature self-tuning algorithm can quickly realize multi-stage temperature control of the furnace tube, and the control is accurate and fast;
TwinCAT HMI, a web-based configuration platform, is easy to operate and powerful;
The horizontal and vertical directions of the equipment can be easily connected to easily realize Industry 4.0.
Summarize
Tujian Automation combines the product advantages of Beckhoff to provide PC-based PECVD solutions, which simplifies the complexity of the system and improves system stability and efficiency. The standardized program structure can be extended to LPCVD, ALD, MOCVD and other equipment.